Seoul National University
Electronics Processing
Research Laboratary
  • INTRODUCTION > ResearchFields > CMP

CMP

What is the CMP

 

 

Cu CMP slurry and post CMP cleaning

 

 

▶ Development of new corrosion inhibitor: 5-aminotetrazole (ATRA)

 

 


 

▶ Development of ceria based Cu CMP slurry (neutral pH)

 

 

 

▶ Development of Cu post CMP cleaning solution

 

 

 

 

In-situ capping process for preventing Cu oxidation

 

 

 

 

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