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해외저널

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게재일 저자 / 논문명 / 저널명 Vol No. Page
2005. 09. 22.
저자
Chang Hwa Lee, Sung Ki Cho and Jae Jeong Kim
논문명
Electroless Cu bottom-up filling using 3-N,N-Dimethylaminodithiocarbanmoyl-1-propanesulfonic acid (DPS)
저널명
Electrochemical and Solid-State Letters.
8 11 J27-J29
2005. 09. 16.
저자
Seung Hwan Cha, Seung-Soo Kim, Sung Ki Cho and Jae Jeong Kim
논문명
Bottom up Filling Using Electrical Oxidation on Pattern Wafer
저널명
Electrochemical and Solid-State Letters.
8 11 C170-C172
2005. 08. 05
저자
Min Cheol Kang, Jae Jeong Kim and Doo-Kyung Moon
논문명
Effect of Organic Additives on Ceria Slurry in Shallow Trench Isolation Chemical Mechanical Planarization
저널명
Japanese Journal of Applied Physics
44 8 5949-5952
2005. 06. 07.
저자
Chang Hwa Lee, Sang Chul Lee, Jae Jeong Kim
논문명
Improvement of electrolessly gap-filled Cu using 2,2'-dipyridyl and bis-(3-sulfopropyl)-disulfide (SPS)
저널명
Electrochemical and Solid-State Letters.
8 8 C110-C113
2005. 05. 30
저자
Chang Hwa Lee, Sang Chul Lee and Jae Jeong Kim
논문명
Bottom-up filling in Cu electroless deposition using bis-(3-sulfopropyl)-disulfide (SPS)
저널명
Electrochimica Acta
50 3563-3568
2005. 05. 05.
저자
Seung Hwan Cha , Hyo-Chol Koo and Jae Jeong Kim
논문명
The Inhibition of Silver Agglomeration by Gold Activation in Silver Electroless Plating
저널명
Journal of The Electrochemical Society
152 6 C388-C391
2005. 04. 07
저자
Sung Ki Cho, Soo-Kil Kim, Jae Jeong Kim
논문명
Superconformal Cu electrodeposition using DPS; A substitutive accelerator for SPS
저널명
Journal of The Electrochemical Society
152 5 C330-C333
2005. 03. 11.
저자
Chang Hwa Lee and Jae Jeong Kim
논문명
Effects of Pd activation on the self annealing of electroless copper deposition using Co(II)-ethylenediamine as a reducing agent
저널명
The Journal of Vacuum Science and Technology B
23 2 475~479
2004. 11. 29.
저자
Soo-Kil Kim, Sung Ki Cho, Jae Jeong Kim, and Young-Soo Lee
논문명
Superconformal Cu Electrodeposition on Various Substrates
저널명
Electrochemical and Solid-State Letters.
8 1 C19~C21
2004. 11. 04.
저자
Sung Ki Cho, Soo-Kil Kim, Hee Han, Jae Jeong Kim, and Seung Mo Oh
논문명
Damascene Cu electrodeposition on metal organic chemical vapor deposition-grown Ru film barrier
저널명
The Journal of Vacuum Science and Technology B
22 6 2649~2653
2004. 09. 07
저자
Eung Jin Ahn and Jae Jeong Kim
논문명
Additives for Super-conformal Electroplating of Ag Thin Film for ULSI
저널명
Electrochemical and Solid-State Letters.
7 10 C118~C120
2004. 08. 04.
저자
Soo-Kil Kim and Jae Jeong Kim
논문명
Additive-free Superfilling in Damascene Cu Electrodeposition using Microcontact Printing
저널명
Electrochemical and Solid-State Letters.
7 9 C101~C103
2004. 08. 04.
저자
Soo-Kil Kim and Jae Jeong Kim
논문명
Superfilling Evolution in Cu Electrodeposition; Dependence on the Aging Time of the Accelerator
저널명
Electrochemical and Solid-State Letters.
7 9 C98~C100
2004. 05. 24.
저자
Hee Han, Jae Jeong Kim and Do Young Yoon
논문명
Pretreatment technique for surface improvement of Ru films in Ru-metalorganic chemical vapor deposition
저널명
The Journal of Vacuum Science and Technology A
22 4 1120-1123
2004. 01. 20.
저자
Chang Hwa Lee and Jae Jeong Kim
논문명
Self-annealing effect of electrolessly deposited copper thin films based on Co(II)-ethylenediamine as a reducing agent
저널명
The Journal of Vacuum Science and Technology B
22 1 180~184
2004. 01. 09.
저자
Oh Joong Kwon, Seung Hwan Cha, and Jae Jeong Kim
논문명
Ruthenium Bottom Electrode Prepared by Electroplating for a High-density DRAM Capacitor
저널명
Journal of the Electrochemical Society
151 2 C127-C132
2003. 12. 09.
저자
Jae Jeong Kim, Soo-Kil Kim, and Yong Shik Kim
논문명
Direct Plating of Low Resistivity Bright Cu Films onto TiN Barrier Layer via Pd Activation
저널명
Journal of the Electrochemical Society
151 1 C97~C101
2003. 09. 15
저자
Jae Jeong Kim, Soo-Kil Kim, and Young Shik Kim
논문명
A Novel Method for Cu Electrodeposition on Indium Tin Oxide Aided by Two-Step Sn-Pd activation
저널명
Japanese Journal of Applied Physics
42 Part 2, No. 9A/B L1080-L1082
2003. 08. 01
저자
Jae Jeong Kim, Seung Hwan Cha, and Young-Soo Lee
논문명
Seedless Fill - up of the Damascene Structure Only by Copper Electroless Plating
저널명
Japanese Journal of Applied Physics
42 Part 2, No. 8A L953-L955
2003. 01. 30.
저자
Jae Jeong Kim, Soo-Kil Kim, Yong Shik Kim
논문명
catalytic behavior of MPSA(3-mercapto-1-propane sulfonic acid) on Cu electrodeposition and its effect on Cu film properties for CMOS device metallization.
저널명
Journal of Electroanalytical Chemistry
542 61-66

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